RoHS analyzer
1.Product introduction:
The new generation of design, is a unique sense of science and technology of one-machine multi-purpose spectrometer, using advanced EFP algorithm and low-light clustering technology with a new generation of multi-channel timely sequencing, specialized type not only retains the performance of the special thickness gauge to detect small samples and grooves, but also can meet the micro-area RoHS detection and full element analysis. Every function is the most professional.
2.Performance advantage
Micro sample detection Minimum measuring area 0.03mm2 Zoom device algorithm The measuring distance can be changed to measure concave and convex shaped samples, and the zoom distance can reach 0-30mm Advanced EFP algorithm Li(3)-U(92) element coating, multiple layers of multiple elements, even the same element in different layers can be accurately measured Advanced spectrum resolution technology Reduce the interference of similar energy elements and reduce the detection limit High performance detector High performance SDD silicon drift detector with measurement accuracy up to nanometer level X-ray apparatus Microfocus enhanced ray tube with focusing device One machine multi-purpose, fine test fine test At the same time to meet the coating, RoHS, and alloy composition detection, and is the fine test, each use is professional grade
| entry Model number | GA-161CS | GA-1614C |
| Coating analysis | It can analyze 23 coatings and 24 kinds of elements at the same time, and it can also analyze and detect 90 kinds of elements of Li(3)-U(92) coating with the same elements in different layers | |
| RoHS analysis | The minimum detection limit of harmful elements (RoHS, halogens) is 2ppm | The minimum detection limit of harmful elements (RoHS, halogens) is 1ppm |
| Component Analysis | S(16)-U(92) | Al(13)-U(92) |
| EFP algorithm | standard | |
| Software operation | humanized closed software, automatically judge fault prompt correction and operation steps to avoid misoperation | |
| Analysis time | 3-200 seconds | 1-200 seconds |
| Detector | Si-Pin semiconductor detector | SDD Silicon drift detector |
| X-ray device | Microfocus enhanced ray tube | |
| collimator | Standard: □0.1*0.3mm; Phi is 0.3 mm; Phi is 1.2 mm; φ3mm four collimator automatic switching (Optional φ0.2mm; Phi is 0.5 mm; Phi is 1.2 mm; Phi is 3 mm)
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| Low light concentration technology | recently measured the spot diffusion is less than 10% | |
| Filter | Four kinds of filter freely switch | |
| Measuring distance | With distance compensation function, can change the measuring distance of concave and convex shaped samples, zoom distance 0-30mm | |
| Sample observation | 1/2.7 “color CCD, zoom function | |
| Focusing mode | Highly sensitive lens, manual focus | |
| magnification | Optical 38-46X, digital amplification 40-200 times | |
| Instrument size | 545mm*380mm*435mm | |
| Sample chamber height | 210mm | |
| Sample table moving mode | High precision XY manual slide rail | |
| Movable range | 50mm*50mm | |
| weight of the instrument | 50kg | |
| Other accessories | A set of computer, printer, accessory box, 12-element sheet, RoHS standard sheet, electroplating solution measurement Measuring cup (optional), standard plate (2 out of 10) | |
| X-ray standards | DIN ISO3497, DIN 50987 and ASTMB568 | |
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